Facilities
Description of significant facilities and large equipment available to the consortium to perform the project
UCM: 3 high pressure oxygen sputtering systems installed in a clean room (ISO class 4) environment. National Facility for microscopy with state of the art transmission electron microscopes (aberration corrected JEOL JEM- ARM200Fand ARM 300) equipped with atomic column resolution EELS tools (Gatan Enfina). ISOM Nanofabrication Facility: laser lithography, e-beam lithography down to 20 nm lateral size.
UMPhy: UHV growth cluster combining two state-of-the-art RHEED-PLD depositions chambers, a sputtering with 5 cathodes, an XPS and a port for a vacuum suitcase compatible with several synchrotron beamlines; In addition CNRS possesses an advanced scanning probe lab (6 microscopes), allowing the nanoscale mapping of different properties various environments (4K –500K temperature range, magnetic field up to 1 T).
MPI-FKF: Advanced cluster tool for the epitaxial growth of complex oxides and their heterostructures.Facilities for transport measurements between 30 mK and 400 K and H = 10 T. Nanostructure lab with two e-beam lithography systems and dual-beam FIB. Several scanning transmission electron microscope systems at the Stuttgart Centre for Electron Microscopy (StEM).
Forschungszentrum Juelich: Electronic Oxide Cluster at the PGI-7/FZ-Juelich (EOC) combines oxide growth (PLD) with local conductive atomic force microscope (LC-AFM), X-ray photoemission spectroscopy (XPS) and photo emission electron microscopy (PEEM). Ernst Ruska-Centre (ER-C) for Microscopy and Spectroscopy with Electrons. A unique high resolution instruments and methods in a joint FZ Jülich and RWTH Aachen platform. Helmholtz Nano Facility for the production of structures and devices for the key areas of «Green Microchips / Computing», Quantum Computing and Neuromorphic Computing, Bioelectronics and Microfluidics. It provides technologies and equipment for the fabrication of nanoscale devices such as electron beam- and nanoimprint lithography.